Publications are available upon request at no cost (except books). Plasma Physics for Thin Films and Materials Synthesis2013 On sheath energization and Ohmic heating in sputtering magnetrons Chunqing Huo, Daniel Lundin, Michael A Raadu, André Anders, Jon Tomas Gudmundsson and Nils Brenning Plasma Sources Sci. Technol. 22, 045005 (2013). Estimating electron drift velocities in magnetron discharges Albert Rauch and André Anders VACUUM, Volume 89, 53-56 (2013). 2012 Plasma and Ion-Beam Assisted Materials Processing Introduction Jose L. Endrino, André Anders, Joakim Andersson, David Horwat, Mykola Vinnichenko Journal of Materials Research 27, 741-742 (2012). 2011 A Plasma Lens for Magnetron Sputtering A. Anders and J. Brown IEEE Transactions on Plasma Science 39, 2528-2529 (2011). Hollow Plasma in a Solenoid A. Anders, M. Kauffeldt, Efim M. Oks, P. K. Roy IEEE Transactions on Plasma Science 39, 2888 - 2889 (2011). Chemistry, phase formation, and catalytic activity of thin palladium-containing oxide films synthesized by plasma-assisted physical vapor deposition D. Horwat, D.I. Zakharov, J.L. Endrino, F. Soldera, A. Anders, S. Migot, R. Karoum, Ph. Vernoux, J.F. Pierson Proceedings of the 12th International Conference on Plasma Surface Engineering, Volume 205, Supplement 2, Pages S171–S177 (2011). Dense Metal Plasma in a Solenoid for Ion Beam Neutralization A. Anders, M. Kauffeldt, Efim M. Oks, P. K. Roy IEEE Transactions on Plasma Science volume: 39 issue: 6 page: 1386-1393 (2011). 2010 David Horwat and André Anders Appl. Phys. Lett. 97, 221501 (2010). A structure zone diagram including plasma-based deposition and ion etching André Anders Thin Solid Films, Volume 518, Issue 15, Pages 4087–4090 (2010). 2009 A discussion on the absence of plasma in spark plasma sintering Dustin M. Hulbert, André Anders, Joakim Andersson, Enrique J. Lavernia, Amiya K. Mukherjee Scripta materialia 60 (10) 835-838 (2009). 2008 The absence of plasma in “spark plasma sintering” Dustin M. Hulbert, André Anders, Dina V. Dudina, Joakim Andersson, Dongtao Jiang, Cosan Unuvar, Umberto Anselmi-Tamburini, Enrique J. Lavernia, and Amiya K. Mukherjee J. Appl. Phys. 104, 033305 (2008). 2007 Source of Low-Energy High-Current Gaseous Ion Flow Based on a Discharge with Electron Injection A. V. Vizir, M. V. Shandrikov, E. M. Oks, G. Yu. Yushkov, A. Anders, D. A. Baldwin IEEE 34th International Conference on Plasma Science, 2007. ICOPS 2007. 2005 Drift Compression of an Intense Neutralized Ion Beam P. K. Roy, S. S. Yu, E. Henestroza, A. Anders, F. M. Bieniosek, J. Coleman, S. Eylon, W. G. Greenway, M. Leitner, B. G. Logan, W. L. Waldron, D. R. Welch, C. Thoma, A. B. Sefkow, E. P. Gilson, P. C. Efthimion, and R. C. Davidson Phys. Rev. Lett. 95, 234801 (2005). 2003 Focusing and neutralization of intense beams Yu, S.S. , Anders, A. ; Bieniosek, F.M. ; Eylon, Shmuel ; Henestroza, Enrique ; Roy, P. ; Shuman, D. ; Waldron, W. ; Sharp, W. ; Rose, D. ; Welch, D. ; Efthimion, P. ; Gilson, E. Proceedings of the Particle Accelerator Conference, 2003. PAC 2003. (Volume:1 ) 2000 Handbook of Plasma Immersion Ion Implantation and Deposition André Anders (Ed.), Wiley, New York, 2000  Breakdown of the high-voltage sheath in metal plasma immersion ion implantation André Anders Appl. Phys. Lett. 76, 28 (2000). A Formulary for Plasma Physics André Anders Berlin, Akademie-Verlag, 1990. ISBN: 3-05-501263-1 .  High Power Impulse Magnetron Sputtering (HiPIMS)2013 Drifting potential humps in ionization zones: The ``propeller blades'' of high power impulse magnetron sputtering A. Anders, M. Panjan, R. Franz, J. Andersson, and P. Ni Spectroscopic imaging of
self-organization in high power impulse magnetron sputtering plasmas J. Andersson, P. Ni and A. Anders Appl. Phys. Lett. 103, 054104-4 (2013). Method and apparatus for improved high power impulse magnetron sputtering Andre Anders Very low pressure high power impulse triggered magnetron sputtering Andre Anders and Joakim Andersson 2012 Plasma flares in high power impulse magnetron sputtering Pavel A. Ni, Christian Hornschuch, Matjaž Panjan, and André Anders Applied Physics Letters 101, 224102 (2012). Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride Efim M. Oks and André Anders Journal of Applied Physics 112, 086103 (2012). Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses Chunqing Huo, Michael A Raadu, Daniel Lundin, Jon Tomas Gudmundsson, André Anders and Nils Brenning Plasma Sources Sci. Technol. 21 045004 (2012). Self-organization and self-limitation in high power impulse magnetron sputtering André Anders Appl. Phys. Lett. 100, 224104 (2012). Plasma potential mapping of high power impulse magnetron sputtering discharges Albert Rauch, Rueben J. Mendelsberg, Jason M. Sanders, and André Anders J. Appl. Phys. 111, 083302 (2012). Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering André Anders, Pavel Ni, and Albert Rauch J. Appl. Phys. 111, 053304 (2012). The 'recycling trap': a generalized explanation of discharge runaway in high-power impulse magnetron sputtering A Anders, J Čapek, M Hála and L Martinu J. Phys. D: Appl. Phys. 45, 012003 (2012). 2011 A synchronized emissive probe for time-resolved plasma potential measurements of pulsed discharges Jason M. Sanders, Albert Rauch, Rueben J. Mendelsberg, and André Anders Rev. Sci. Instrum. 82, 093505 (2011). Discharge physics of high power impulse magnetron sputtering André Anders Proceedings of the 12th International Conference on Plasma Surface Engineering, Volume 205, Supplement 2, Pages S1–S9 (2011). 2010 Compression and strong rarefaction in high power impulse magnetron sputtering discharges David Horwat and André Anders J. Appl. Phys. 108, 123306 (2010). Origin of the Delayed Current Onset in High-Power Impulse Magnetron Sputtering G. Yu Yushkov, A. Anders IEEE Transactions on Plasma Science (Volume:38 , Issue: 11 ) Page(s): 3028 - 3034 (2010). Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering Arutiun P Ehiasarian, Joakim Andersson and André Anders J. Phys. D: Appl. Phys. 43, 275204 (2010). Deposition rates of high power impulse magnetron sputtering: Physics and economics A. Anders J. Vac. Sci. Technol. A 28, 783 (2010). High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition André Anders Surface and Coatings Technology, Volume 204, Issues 18–19, Pages 2864–2868 (2010). 2009 Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion GeneratorJoakim Andersson and André Anders Phys. Rev. Lett. 102, 045003 (2009). Broad, intense, quiescent beam of singly charged metal ions obtained by extraction from self-sputtering plasma far above the runaway threshold Andre Anders, Efim Oks Journal of Applied Physics 106, 023306 (2009). Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer Efim Oks, Andre Anders Journal of Applied Physics 105, 093304 (2009). Plasma “anti-assistance” and “self-assistance” to high power impulse magnetron sputtering Andre Anders, Georgy Yu. Yushkov Journal of Applied Physics 105, 073301 (2009). Physical limits for high ion charge states in pulsed discharges in vacuum Georgy Yu. Yushkov, Andre Anders Journal of Applied Physics 105, 043303 (2009). 2008 J. Andersson and A. Anders Self-sputtering runaway in high power impulse magnetron sputtering: The
role of secondary electrons and multiply charged metal ions André Anders Appl. Phys. Lett. 92, 201501 (2008). Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma J. Andersson, A. P. Ehiasarian, and A. Anders Deposition rates of high power impulse magnetron sputtering A. Anders Physics of high power impulse magnetron sputtering and plasma-based ion implantation & deposition: a comparison A. Anders 2007 High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering A. Anders, J. Andersson, and A. Ehiasarian Observation of self-sputtering in energetic condensation of metal ions A. Anders 2003 Carbon thin film deposition using high power pulsed magnetron sputtering B. M. DeKoven, P. R. Ward, R. E. Weiss, D. J. Christie, R. A. Scholl, W. D. Sproul, F. Tomasel, and A. Anders 1995 Self-sustained self-sputtering: A possible mechanism for the superdense glow phase of a pseudospark A. Anders, S. Anders, M. A. Gundersen, and A. M. Martsinovskii Cathodic Arc Deposition2013 Structural, optical, and electrical properties of indium doped cadmium oxide films prepared by pulsed filtered cathodic arc deposition Yuankun Zhu, Rueben J. Mendelsberg, Jiaqi Zhu, Jiecai Han, and André Anders Journal of Materials Science, Volume 48, Issue 10, pp 3789-3797 (2013). Transparent and conductive indium doped cadmium oxide thin films prepared by pulsed filtered cathodic arc deposition Yuankun Zhu, Rueben J. Mendelsberg, Jiaqi Zhu, Jiecai Han, André Anders Applied Surface Science 265, 738-744 (2013). 2012 The evolution of ion charge states in cathodic vacuum arc plasmas: a review André Anders Plasma Sources Sci. Technol. 21, 035014 (2012). Improved structural and electrical properties of thin ZnO:Al films by dc filtered cathodic arc deposition Yuankun Zhu, Rueben J. Mendelsberg, Sunnie H.N. Lim, Jiaqi Zhu, Jiecai Han and André Anders Journal of Materials Research 27, 857-862 (2012). Charge state distributions of Al and Cr cathodic arc plasmas R. Franz, J. Wallig, P. Polcik, A. Anders 2012 25th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV), 541-544 (2012). Phase transitions in vacuum arcs in the context of liquid metal arc sources A. Anders and J. Slack 2012 XXVth International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV 2012) Pages: 305-8 Published: 2012 DOI: 10.1109/DEIV.2012.6412514 Charge state distributions of Al and Cr cathodic arc plasmas R. Franz, J. Wallig, P. Polcik, A. Anders 2012 XXVth International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV 2012) Pages: 541-4 Published: 2012 DOI: 10.1109/DEIV.2012.6412575 2011 Achieving high mobility ZnO : Al at very high growth rates by dc filtered cathodic arc deposition R. J. Mendelsberg, S. H. N. Lim, Y. K. Zhu, J. Wallig, D. J. Milliron and A Anders Phys. D: Appl. Phys. 44, 232003 (2011). Measurements of the Ion Species of Cathodic Arc Plasma in an Axial Magnetic Field E. M. Oks, A. Anders IEEE Transactions on Plasma Science, volume: 39 issue: 6 page: 1272-1276 (2011). Preparation of high transmittance ZnO:Al film by pulsed filtered cathodic arc technology and rapid thermal annealing F. Gao, K. M. Yu, R. J. Mendelsberg, A. Anders, W. Walukiewicz Applied Surface Science, volume: 257, issue: 15 page: 7019-7022 (2011). 2011 Unfiltered and filtered cathodic arc deposition André Anders 2008 Cathodic Arcs: From Fractal Spots to Energetic Condensation André Anders, Springer, New York, 2008.  A Theoretical Analysis of Vacuum Arc Thruster and Vacuum Arc Ion Thruster Performance J.E. Polk, M.J. Sekerak, J.K. Ziemer, J. Schein, Niansheng Qi, A. Anders IEEE Transactions on Plasma Science 36, 2167-2179 (2008). Temporal development of ion beam mean charge state in pulsed vacuum arc ion sources E. M. Oks, G. Yu. Yushkov, and A. Anders Rev. Sci. Instrum. 79, 02B301 (2008). 2006 Charge state dependence of cathodic vacuum arc ion energy and velocity distributions Johanna Rosén, Jochen M. Schneider, and André Anders Appl. Phys. Lett. 89, 141502 (2006). 2003 Cathodic Arc Plasma Deposition André Anders Vacuum Technology & Coating vol.3, no 7, 27-35 (2002). Vacuum Technology & Coating vol.3, no 8, 34-41 (2002). 2002 Atomic scale heating in cathodic arc plasma deposition André Anders Appl. Phys. Lett. 80, 1100 (2002). Further development of low noise vacuum arc ion source Efim Oks, George Yushkov, Irina Litovko, André Anders, and Ian Brown Rev. Sci. Instrum. 73, 735 (2002). 2001 Energetics of vacuum arc cathode spots André Anders and Ashok V. Kulkarni MRS Proceedings / Volume 675 / 2001. 1999 Efficient, compact power supply for repetitively pulsed, “triggerless” cathodic arcs André Anders, Robert A. MacGill, and Thomas A. McVeigh Rev. Sci. Instrum. 70, 4532 (1999). 1998 Interaction of vacuum-arc-generated macroparticles with a liquid surface André Anders Appl. Phys. Lett. 73, 3199 (1998). 1996 Properties of cathodic arc deposited high-temperature superconducting composite thin films on Ag substrates M.S. Chae, M.T. Simnad, M.B. Maple, S. Anders, A. Anders, I.G. Brown Physica C: Superconductivity, Volume 270, Issues 1–2, Pages 173–179 (1996). High ion charge states in a high‐current, short‐pulse, vacuum arc ion source André Anders, Ian Brown, Robert MacGill, and Michael Dickinson Rev. Sci. Instrum. 67, 1202 (1996). 1995 Film synthesis on powders by cathodic arc plasma deposition Andre Anders, Simone Anders, Ian G. Brown, Igor C. Ivanov Materials Research Society symposia proceedings. Materials Research Society 388:215-220 (1995). Preparation of cathodic arc deposited HTSC Bi2Sr2CaCu2O8+y-Ag composite thin films on Ag substrates M.S. Chae, M.B. Maple, M.T. Simnad, S. Anders, A. Anders, I.G. Brown IEEE Transactions on Applied Superconductivity (Volume:5 , Issue: 2 ) 2011-2014 (1995). Effect of intrinsic growth stress on the Raman spectra of vacuum‐arc‐deposited amorphous carbon films Joel W. Ager, Simone Anders, Andre Anders, and Ian G. Brown Oxides2013 Dopant-induced band filling and bandgap renormalization in CdO : In films Yuankun Zhu, Rueben J Mendelsberg, Jiaqi Zhu, Jiecai Han and André Anders Journal of Physics D: Applied Physics Volume 46 Number 19, 195102 (2013). 2012 Determining the nonparabolicity factor of the CdO conduction band using indium doping and the Drude theory Rueben J. Mendelsberg, Yuankun Zhu, and André Anders Journal of Physics D-Applied Physics 45, 425302 (2012). Efficient, Low Cost Synthesis of Sodium Platinum Bronze NaxPt3O4 David Horwat, Moukrane Dehmas, Alejandro Gutiérrez, Jean-François Pierson, André Anders, Flavio Soldera, and José-Luis Endrino Chem. Mater. 24 (13), 2429–2432 (2012). Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films Adolfo Mosquera, David Horwat, Luis Vazquez, Alejandro Gutiérrez, Alexei Erkoa, André Anders, Joakim Andersson and Jose L. Endrino Journal of Materials Research 27, 829-836 (2012). SRF cavities 2011 Deposition of niobium and other superconducting materials with high power impulse magnetron sputtering: Concept and first results (Invited Talk) André Anders, Rueben J. Mendelsberg, Sunnie Lim, Matthijs Mentink, Jonathan L. Slack, Joseph G. Wallig, Alexander V. Nollau, Georgy Yu. Yushkov 15th International Conference on RF Superconductivity, Chicago, IL, July 25-29, 2011, free download here. Analysis of Bulk and Thin Film Model Samples Intended for Investigating the Strain Sensitivity of Niobium-Tin M.G.T. Mentink, A. Anders, M.M.J. Dhalle, D. R. Dietderich, A. Godeke, W. Goldacker, F. Hellman, H.H.J. ten Kate, D. Putnam, J. L. Slack, M. D. Sumption, M. A. Susner IEEE Transactions on Applied Superconductivity volume: 21, issue: 3 page: 2550-2553 (2011). Examination of the technical potential of near-infrared switching thermochromic windows for commercial building applications 2-D mathematical modeling for a large electrochromic window—Part I Yong Liu, Lizhong Sun, Godfrey Sikha, Jan Isidorsson, Sunnie Lim, Andre Anders, B. Leo Kwak, Joseph G. Gordon II Solar Energy Materials and Solar Cells 120, Part A, 1 (2014). 2013 Modeling of optical and energy performance of tungsten-oxide-based electrochromic windows including their intermediate states Sunnie H.N. Lim, Jan Isidorsson, Lizhong Sun, B. Leo Kwak, André Anders Solar Energy Materials and Solar Cells 108, 129-135 (2013). 2011 Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals Guillermo Garcia, Raffaella Buonsanti, Evan L. Runnerstrom, Rueben J. Mendelsberg, Anna Llordes, Andre Anders, Thomas J. Richardson, and Delia J. Milliron Nano Lett. 11 (10), pp 4415–4420 (2011). Nanoparticle Synthesis2013 Size and composition-controlled fabrication of thermochromic metal oxide nanocrystals César Clavero, Jonathan L Slack and André Anders Journal of Physics D: Applied Physics 46, 362001 (2013). Evolution of Ordered Metal Chalcogenide Architectures Through Chemical Transformation J. Rivest, R. Buonsanti, T. Pick, L. Zhu, E. Lim, C. Clavero, E. Schaible, B. Helms, and D. Milliron, Journal of the American Chemical Society 135 (20), pp 7446–7449 (2013). Miscellanea2014
2011 Optical Studies of Strain ed InGaN/GaN Quantum Structures Implanted with Europium for Red Light Emitting Diodes J. Wang, W. Jadwisienczak, M. A. Ebdah, M. E. Kordesch, and A. Anders 2011 International Semiconductor Device Research Symposium (ISDRS), page 1 (2011). ISBN: 978-1-4577-1755-0 Optical properties of ferromagnetic ytterbium-doped III-nitride epilayers W. Jadwisienczak, R. Palai, J. Wang, H. Tanaka, J. Wu, A. Rivera, H. Huhtinen, A. Anders Physica status solidi. C, Current topics in solid state physics 8, 2185-2187 (2011). 2010 Antibacterial efficacy of advanced silver-amorphous carbon coatings deposited using the pulsed dual cathodic arc technique J L Endrino, A Anders, J M Albella, J A Horton, T H Horton, P R Ayyalasomayajula, M Allen Journal of Physics Conference Series 252 012012 (2010). 2009 X-ray Diffraction Study of InGaN/GaN Superlattice Implanted with Eu3+ Ions Mohammad Ahmad Ebdah, Martin E. Kordesch, Andre Anders, Wojciech M. Jadwisienczak MRS Proceedings Volume 1202 (2009). Spectra and energy levels of Yb3+ in AlN T. Koubaa, M. Dammak, M. Kammoun, W. M. Jadwisienczak, H. J. Lozykowski, A. Anders J. Appl. Phys. 106, 013106 (2009). 2008 Effects of ozone oxidation on interfacial and dielectric properties of thin HfO2 films L. Wang, Paul K. Chu, Andre Anders, Nathan W. Cheung Journal of Applied Physics 104, 054117 (2008). |
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