High power impulse magnetron sputtering (HIPIMS) is a relatively young physical vapor deposition (PVD) technology that combines magnetron sputtering with pulsed power technology. The objective is to achieve ionization of the sputtered atoms in order to have ions available for substrate etching (pre-treatment) and/or for assistance to the film growth process, leading to well-adherent coatings of desirable microstructure and properties.
Discharge physics of high power impulse magnetron sputtering, André Anders, Proceedings of the 12th International Conference on Plasma Surface Engineering, Volume 205, Supplement 2, Pages S1–S9 (2011).
HiPIMS plasma on a copper target
Research Topics >