André Anders is a Senior Scientist and the Leader of the Plasma Applications Group at Lawrence Berkeley National Laboratory (LBNL), Berkeley, California. He studied physics at the University Wroclaw, Poland, Humboldt University Berlin, then East-Germany, and at the Lomonosov Moscow State University, Moscow, Russia, then Soviet Union. He holds an M.S. degree ('84) and Ph.D. degree ('87) in physics from Humboldt University, Berlin. He was a Staff Scientist at the Academy of Sciences in East Berlin (1987-1991), witnessing the fall of the Berlin Wall in November 1989. In 1992, using new opportunities, he moved to Berkeley, California, to join LBNL where his research involved topics of plasma physics and material science, including coatings and thin film synthesis, high power impulse magnetron sputtering, cathodic vacuum arc plasma and ion sources, gas plasma sources, ion implantation, and plasma immersion ion implantation, transparent conducting oxides, and electrochromic materials. As a group leader he hosted many students and scholars visiting Berkeley from all over the world.
Andre has extensively published. He is the author/co-author of about 275 papers in peer-reviewed journals and has authored/edited three books: Cathodic Arcs: From Fractal Spots to Energetic Condensation, Springer, New York 2008, the Handbook of Plasma Immersion Ion Implantation and Deposition), and A Formulary for Plasma Physics (1990, Berlin: Akademie-Verlag, now merged with Wiley-VCH) - this book is out of print and can be downloaded from this webpage free of charge.
Andre serves as Associate Editor of the the Journal of Applied Physics. He was on the Editorial Boards of the journals Surface and Coatings Technology (2004-2014), and Applied Physics Letters & Journal of Applied Physics (2009-2011). He served as co-chair of the XVIIth International Symposium on Discharges and Electrical Insulation (ISDEIV, 1996) and was twice Guest Editor of IEEE Transactions on Plasma Science (1997, 2001). In 1997 and 1998 he was LBNL’s program manager for IPP, a DOE-sponsored Non-Proliferation Program. He is currently the Treasurer of the Permanent International Scientific Committee of ISDEIV, after serving as Secretary (2000-2006) and Chairman (2006-2012) of this body. He is currently a member of several program committees of international conferences on plasmas and thin films, and the 2014 Chair-Elect of the Executive Committee, Advanced Surface Engineering Division of the American Vacuum Society (AVS).
In 2011, Andre was recognized by the Mentor Award of the Society of Vacuum Coaters; earlier he received the IEEE Merit Award of the Nuclear and Plasma Sciences Society (2010), the Chatterton Award (1994), and two R&D 100 Awards: (1997) for the development of the Constricted Plasma Source, and 2009 for developing pulsed filtered arc technology that is used for the deposition of ultrathin films of diamond-like carbon on read-write heads for computer hard disks. He is a member of the Materials Research Society and the Society of Vacuum Coaters. He was elected Fellow of IEEE (the Institute of Electrical and Electronics Engineers) in 2001, Fellow of the Institute of Physics (UK) in 2002, Fellow of the American Physical Society (2008), and Fellow of the American Vacuum Society (2011).
Time permitting, he loves flying single-engine airplanes to enjoy the beautiful views over the San Francisco Bay.