
André Anders is a Senior Scientist and the Leader of the Plasma Applications Group at Lawrence Berkeley National Laboratory (LBNL), Berkeley, California. He studied physics at the University Wroclaw, Poland, Humboldt University Berlin, Germany, and at the Lomonosov Moscow State University, Moscow, Russia. He holds an M.S. degree ('84) and Ph.D. degree ('87) in physics from Humboldt University, Berlin. He was a Staff Scientist at the Academy of Sciences in East Berlin (1987-1991). In 1992, after the fall of the Berlin Wall, he moved to Berkeley, California, to join LBNL where his research involved topics of plasma physics and material science, including coatings and thin film synthesis, high power impulse magnetron sputtering, cathodic vacuum arc plasma and ion sources, gas plasma sources, ion implantation, and plasma immersion ion implantation. As a group leader he hosted many students and scholars visiting Berkeley from all over the world.
Andre has extensively published. He is the author/co-author of over 250 papers in peer-reviewed journals and authored/edited three books: Cathodic Arcs: From Fractal Spots to Energetic Condensation, Springer, New York 2008, the Handbook of Plasma Immersion Ion Implantation and Deposition (New York: Wiley, 2000, and Wiley-VCH, 2004), and A Formulary for Plasma Physics (Berlin: Akademie-Verlag [now a subsidiary of Wiley-VCH], 1990).
Giving back to the scientific community, he is an Associate Editor of the the Journal of Applied Physics and he serves on the Editorial Boards of the journals Surface and Coatings Technology, Applied Physics Letters, and the Journal of Applied Physics. He served as a co-chair of the XVIIth International Symposium on Discharges and Electrical Insulation (ISDEIV, 1996) and was twice Guest Editor of IEEE Transactions on Plasma Science (1997, 2001). In 1997 and 1998 he was LBNL’s program manager for IPP, a DOE-sponsored Non-Proliferation Program. He is currently the Chair of the Permanent International Scientific Committee of ISDEIV, a member of several program committees of international conferences on plasmas and thin films.
In 2010, Andre was recognized by the IEEE Merit Award of the Nuclear and Plasma Society. Earlier he received the Chatterton Award (1994) for a laser-based plasma diagnostics system for vacuum arc cathode spots, an R&D 100 Award (1997) for the development of the Constricted Plasma Source, and a second R&D 100 Award for the developing pulsed filtered arc technology that is used for the deposition of ultrathin films of diamond-like carbon on read-write heads for computer hard disks. He is a member of the Materials Research Society, the American Vacuum Society , and the Society of Vacuum Coaters. He was elected Fellow of IEEE (the Institute of Electrical and Electronics Engineers) in 2001, Fellow of the Institute of Physics (UK) in 2002, and Fellow of the American Physical Society (2008).
Time permitting, he loves flying single-engine airplanes to enjoy the beautiful views over the San Francisco Bay.